JPH0315336B2 - - Google Patents
Info
- Publication number
- JPH0315336B2 JPH0315336B2 JP60261848A JP26184885A JPH0315336B2 JP H0315336 B2 JPH0315336 B2 JP H0315336B2 JP 60261848 A JP60261848 A JP 60261848A JP 26184885 A JP26184885 A JP 26184885A JP H0315336 B2 JPH0315336 B2 JP H0315336B2
- Authority
- JP
- Japan
- Prior art keywords
- holder
- processing chamber
- chamber
- gate valve
- diffusion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP26184885A JPS62122123A (ja) | 1985-11-21 | 1985-11-21 | 縦型熱処理装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP26184885A JPS62122123A (ja) | 1985-11-21 | 1985-11-21 | 縦型熱処理装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS62122123A JPS62122123A (ja) | 1987-06-03 |
JPH0315336B2 true JPH0315336B2 (en]) | 1991-02-28 |
Family
ID=17367584
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP26184885A Granted JPS62122123A (ja) | 1985-11-21 | 1985-11-21 | 縦型熱処理装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS62122123A (en]) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0311621A (ja) * | 1989-06-08 | 1991-01-18 | Nec Corp | 半導体ウエハ熱処理装置 |
US6036482A (en) * | 1995-02-10 | 2000-03-14 | Tokyo Electron Limited | Heat treatment method |
KR100407412B1 (ko) * | 1995-02-10 | 2004-03-24 | 동경 엘렉트론 주식회사 | 열처리방법및그장치 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6029295B2 (ja) * | 1979-08-16 | 1985-07-10 | 舜平 山崎 | 非単結晶被膜形成法 |
JPS56165317A (en) * | 1980-05-26 | 1981-12-18 | Fujitsu Ltd | Manufacture of semiconductor device |
JPS5875840A (ja) * | 1981-10-30 | 1983-05-07 | Fujitsu Ltd | 半導体用加熱処理炉 |
-
1985
- 1985-11-21 JP JP26184885A patent/JPS62122123A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS62122123A (ja) | 1987-06-03 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
EXPY | Cancellation because of completion of term |